We are pleased to announce that our paper, entitled “FIB Secondary Etching Method for Fabrication of Fine CNT Forest Metamaterials”, has been published in Nano-Micro Letters.
FIB Secondary Etching Method for Fabrication of Fine CNT Forest Metamaterials,
Adam Pander, Akimitsu Hatta, and Hiroshi Furuta,
Nano-Micro Letters (2017) 9:44.
In this paper,
- a newly developed FIB secondary etching method enables the precise fabrication of SWNT forest patterns in sizes from
hundreds of nanometers to several micrometers, for the first time. This method fills the previous fabrication gap in this range.
- The precise control of the CNT forest structure is achieved by controlling the FIB processing parameters.
- By applying FIB secondary etching, the growth of the FIB-patterned CNT forest is significantly improved, enabling
them to be used in metamaterial, electronic, photonic, and thermal applications.